The project NILecho II addresses the development of innovative nanoimprinting processes applicable in the field of organic electronics. In view of printed electronics and industrial or R2R-compatible fabrication, NILecho I successfully defined a self-aligned process flow based on hot embossing for the fabrication of submicron organic thin film transistors with very low parasitic capacitances and therefore very high switching speeds for organic electronics (in the 100 kHz to 1MHz regime). The worldwide first nanoimprinted complementary organic inverter with submicron channel lengths was realized.


NILecho II will implement this technology to fabricate fast organic logic gates with printable materials for the application in circuit elements used for display drivers such as shift registers. This is a major step on the way to printable and high resolution organic electronics.


Prelonic technologies as industrial partner and producer of printed electronic devices is strongly interested in expanding the product portfolio by printable high-resolution transistors and logic gates developed within NILecho II. Together with prelonicâ??s printable batteries, displays, push buttons and conductors a very large application field from display driving over RFID to sensor read-outs is instantaneously opened.

The combination of printed organic logic gates and high-resolution self-aligned nanoimprinting is unique in the organic electronics world. Only Hewlett Packard already showed a self-aligned nanoimprinted process for thin film electronics, which is, however, exclusively applicable to inorganic materials exclusively.


The project consortium is built of four partners. Joanneum Research as project leader will - based on results from NILecho I and together with prelonic technologies - implement printable materials into the self aligned nanoimprinting process (either hot embossing or on UV-NIL) to fabricate p- and n-type transistors and improve the designs by complementary inverters and logic gates. Prelonic technologies will combine these devices with printed displays and test their performance in product environment. The Center for Electron Microscopy (ZfE) will do nanoanalysis and characterisation of these samples and devices including FIB (focused ion beam) cross sections at cryo temperatures, high resolution TEM measurements and element sensitive characterisation. These investigations will be done close to the production process, which is of great importance in view of the introduction of new material classes in the nanoimprinting process, their stability and electrical performance. mb-technologies as long-term partner of JR for measuring equipment will develop a high-frequency electrical measuring tool for the detailed characterisation of the fabricated devices and circuits.