Conference Proceedings

Eurodisplay 2013

  • T. Rothländer, P.C. Hütter, H. Gold, A. Haase, G. Jakopic, P. Hartmann, B. Stadlober
    Nanoimprinted Organic Electrochemical Transistors
    Proceedings of the Eurodisplay 2013 (2013) 179-180

 

 

COMS 2011

  • NILaustria, a research project cluster dedicated to Nanoimprint Lithography
    Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Rainer Schöftner, Christian Wögerer
    COMS 2011, Greensboro, August 2011

 

 

Alternative Lithographic Technologies II
Proceedings SPIE Volume: 7637

  • Maskless Lithography and nanopatterning with electron and ion multibeam projection
    Elmar Platzgummer
    Proc SPIE Vol. 7637 (2010) 763703-1-12



Photomask Technology 2010
Proceedings SPIE Volume: 7823

  • eMET - 50keV Mask Exposure Tool Development based on proven mulit-beam projection technology
    Elmar Platzgummer, Stefan Cernusca, Christof Klein, Jan Klikovits, Samuel Kvasnica, Hans Loeschner
    Proc SPIE Vol. 7823 (2010) 782308-1-12



Winterschool on Organic Electronics - Fundamental Properties of Devices - Sensors, Transistors, and Solar Cells

  • Controlling the device properties of Organic Thin Film Transistors by the application of Photoreacitve Polymer Interfacial Layers - M. Marchl, A. Golubkov, P. Pacher, S.J. Ausserlechner, T. Obermüller, A. Haase, B. Stadlober, M. Edler, G. Trimmel, T. Griesser, E. Zojer - Winterschool on Organic Electronics - Fundamental Properties of Devices - Sensors, Transistors, and Solar Cells - p 28
  • Impact of Chemically Reactive Alkyltrichlorosilane Layers on the Threshold Voltage of Organic Thin Film Transistors - S.J. Ausserlechner, H.-G. Flesch, M. Marchl, P. Pacher, T. Obermüller, A. Golublo, S. Posanner, A. Haase, B. Stadlober, g. Trimmel, R. Resel, K. Zojer, F. Schürer, E. Zojer - Winterschool on Organic Electronics - Fundamental Properties of Devices - Sensors, Transistors, and Solar Cells  - p80

MRS

  • Simulation of ion beam induced etching and deposition using a non-local recoil-based algorithm - C. Ebm, G.Hobler - Mat. Res. Soc. Proc. 1181 (2009) DD03-04

Organic Semiconductor Conference 2009

  • Nanoimprinted n-type organic transistors - U. Palfinger, Ch. Auner, H. Gold, M. belegratis, V. Satzinger, B. Stadlober, G. Jakopic, J.R. Krenn -  Proceedings, Full Paper, Organic Semiconductor Conference 2009
  • Ultra-thin hybird dielectrics in sub µm NIL OTFTs - J. Kraxner, U. Palfinger, B. Stadlober, Ch. Auner, A. Haase, H. gold, M. Belegratis, G. Jakopic, J.R. Krenn, G. Domann - Proceedings, Full Paper, Organic Semiconductor Conference 2009

International School and Conference on Photonics, PHOTONICA 2009

  • Modelling the Variable Angle Reflection and Transmission from Metameterial Slabs, G. Isic, B. Vasic, M. Miric, B. Jokanovic, I. Bergmair, R. Gajic, K. Hingerl, Acta Physica Polonica A, 116 (2009) 631-634. Proceedings of the International School and Conference on Photonics, PHOTONICA 2009 pdf
  • Optical Properties of the (3.12.12) Hexagonal Archimedean Photonic Crystal, D. Jovanovic, R. Gajic, K. Hingerl, Acta Physica Polonica A, 116 (2009) 642-644. Proceeding sof the International School and Conference on Photonics, PHOTONICA 2009 pdf
  • Confined Metamaterial Structures BAsed on Coordinate Transformations, B Basic, R. Gajic, G. Isic, K. Hingerl, Acta Physica Polonica A, 116 (2009) 96-98. Proceeding sof the International School and Conference on Photonics, PHOTONICA 2009 pdf


3rd Vienna International Conference Nano-Technology

  • Fabrication of Negative Index Materials by Nanoimprint Lithography - I. Bergmair, M. Mühlberger, W. Schwinger, R. Schöftner, K. Hingerl, 3rd Vienna International Conference Nano-Technology, March 18-20, 2009, Vienna, Austria, p. 253 - 257, ISBN 978-3-9021657-32-0
  • Introduction into Nanoimprint Lithography - current state of the art, applications and perspectives - Michael Mühlberger, 3rd Vienna International Conference Nano-Technology, March 18-20, 2009, Vienna, Austria, p. 253 - 257, ISBN 978-3-9021657-32-0 
  • Sub-micrometer channel length OTFTs and circuits with ultra-thin organic gate dielcetrics by Nanoimprint Lithography - U. Palfinger, 3rd Vienna International Conference Nano-Technology, March 18-20, 2009, Vienna, Austria, p. 253 - 257, ISBN 978-3-9021657-32-0
  • Soft-UV-NIL is an enabling technology for industrial applications - G. Kreindl, 3rd Vienna International Conference Nano-Technology, March 18-20, 2009, Vienna, Austria, p. 253 â?? 257, ISBN 978-3-9021657-32-0

 


7th International Conference on Nanoimprint and Nanoprint Technology 2008

  • Fabrication of 3D structures by Micro Contact Printing on Topography - I. Bergmair*, M. Mühlberger*, W. Schwinger, K. Hingerl, R. Schöftner, Digest of the 7th International Conference on Nanoimprint and Nanoprint Technology 2008 Kyoto, Japan, ISBN 4-9902472-6-4, p. 90-91, Secretaryart Corporation, Tokyo, Japan, October 2008.
  •  Reversal µCP using hard stamps for the fabrication of negative index materials -I. Bergmair, M. Mühlberger, W. Schwinger, K. Hingerl, R. Schöftner, Digest of the 7th International Conference on Nanoimprint and Nanoprint Technology 2008 Kyoto, Japan, ISBN 4-9902472-6-4, p. 216-217, Secretaryart Corporation, Tokyo, Japan, October 2008.
  •  Soft UV-NIL Enables Industrial Applications - T. Glinsner, G. Kreindl, A. Malzer, R. födisch, P. Lindner, M. Wimplinger, R. Miller, Digest of the 7th International Conference on Nanoimprint and Nanoprint Technology 2008 Kyoto, Japan, ISBN 4-9902472-6-4, p. 142-143, Secretaryart Corporation, Tokyo, Japan, October 2008.
  • UV-NIL using Working Stamps made from Ormostamp - M. Mühlbergr, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, R.Schöftner, Digest of the 7th International Conference on Nanoimprint and Nanoprint Technology 2008 Kyoto, Japan, ISBN 4-9902472-6-4, p. 154-155, Secretaryart Corporation, Tokyo, Japan, October 2008.

 

 GMe-Forum 2008

  • Nanoimprint Lithography
    M. Mühlberger, I. Bergmair, W. Schwinger, M. Chouiki, H. Wiesbauer, H. Leichtfried, R. Schöftner
    GMe-Forum 2008, ISBN 978-3-901578-20-5

eMRS, Warsaw, Septermber 2008

  • Waveguiding Effect in GaAs 2DHexagonal Photonic Crystal Tiling
    D. Jovanovic, R. Gajic, D. Djokic, K. Hingerl
    eMRS, Warsaw, Septermber 2008, Acta Physica Polonica A 116 (1) 55 - 57 (2008)

 

 Emerging Lithographic Technologies XII

Proceedings of SPIE Volume: 6921

  • Projection maskless lithography (PML2): proof-of-concept setup and first experimental results - C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel, M. Tmej, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, Proc. SPIE Vol. 6921-1O [6921-93]

 

Alternative Lithographic Technologies
Proceedings of SPIE Volume: 7271

  • PML2: the maskless multibeam solution for the 22-nm node and beyond - C. Klein, E. Platzgummer, J. Klikovits, W. Piller,  H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle,  J. Kretz, J. T. Nogatch, A. Zepka - Proc. SPIE / Volume 7271 / Multibeam and Tools Patterning