Publications in peer-reviewed journals

  1. J. Kastner, O. Lorret, A. Rank, C. Schwarzinger, B. Dittert, M. Mühlberger - Nanocontact Printing Stamp Material based on Bi-functionalized Polyhedral Oligomeric Silsesquioxanes, European Polymer Journal, available online 22 November 2014, doi:10.1016/j.eurpolymj.2014.11.015

  2. Dostalek J and Knoll W Plasmonics in "Polymer Science: A Comprehensive Reference", Vol 2, pp. 647-659. Edited by Matyjaszewski K and Möller M , Amsterdam: Elsevier BV. (2012) ISBN: 978-0-08-087862-1

  3. Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli - Focused ion beam direct patterning of hardmask layers - J. Vac. Sci. Technol. B 32, 041602 (2014);

  4. Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli - Generation of 3D Nanopatterns with Smooth Surfaces - Nanotechnology 25 (2014) 315302

  5. T. Rothlaender, A. Fian, J. Kraxner, W. Grogger, H. Gold, A. Haase, B. Stadlober, Channel length variation in self-aligned, nanoimprint lithography structured OTFTs, Organic Electronics 2014, in print, doi: 10.1016/j.orgel.2014.08.055

  6. T. Rothlaender, P.C. Huetter, E. Renner, H. Gold, A. Haase, B. Stadlober, Nanoimprint Lithography-Structured Organic Electrochemical Transistors and Logic Circuits, IEEE Trans. Electron Devices. 61 (2014) 1515â??1519. doi:10.1109/TED.2014.2312986.

  7. M. Bauch, K. Toma, M. Toma, Q. Zhang, J. Dostalek, Surface plasmon-enhanced fluorescence biosensors: a review, Plasmonics (2014), 9(4) 781-799

  8. CJ. Huang, W. Knoll, A. Sessitsch, J. Dostalek, SPR bacterial pathogen biosensors: the importance of fluidic conditions and probing depth, Talanta (2014), accepted.

  9. A. Pospischil, M. Humer, M.M. Furchi, D. Bachmann, R. Guider, T.Fromherz, T. Mueller, CMOS-compatible graphene photodetector covering all optical communication bands, nature photonics 2013 doi:10.1038/nphoton.2013.240

  10. Simon Waid, Heinz D. Wanzenboeck, Marco Gavagnin, Ruppert Langegger, Michael Muehlberger, and Emmerich Bertagnolli, Focused ion beam induced Ga-contaminationâ??An obstacle for UV-nanoimprint stamp repair? - J. Vac. Sci. Technol. B 31, 041602 (2013)

  11. R. Mejard, J. Dostalek, CJ. Huang, H. Griesser, B. Thierry
    Tunable and robust long range surface plasmon resonance for biosensor applications
    Optics Materials (2013), 35 (12) 2507-2513

  12. M. Bauch, J. Dostalek
    Collective localized surface plasmon-enhanced fluorescence for high performance biosensors
    Optics Express (2013), 21 (17) 20470-20483 

  13. Influence of geometry variations on the response of organic electrochemical transistors
    Applied Physics Letters 103 (2013) 043308
    P.C. Hütter, T. Rothländer, A. Haase, G. Trimmel, B. Stadlober

  14. Compact Biochip for Surface Plasmon-Enhanced Fluorescence Assays,
    Optics Express, (2013) 21(8) 10121-10132
    K. Toma, P. Adam, M. Vala, J. Homola, W. Knoll, J. Dostalek

  15. P. Klenovský, M. Brehm, V. Křápek, E. Lausecker, D. Munzar, F. Hackl, H. Steiner, T. Fromherz, G. Bauer, J. Humlíček
    Excitation intensity dependence of photoluminescence spectra of SiGe quantum dots grown on prepatterned Si substrates: Evidence for biexcitonic transition
    Phys. Rev. B 86 (2012) 115305

  16. M. Furchi, A. Urich, A. Pospischil, G. Lilley, K. Unterrainer, H. Detz, P. Klang, A.M. Andrews, W. Schrenk, G. Strasser, and T. Mueller
    Microcavity-Integrated Graphene Photodetector
    Nano Lett. 12, 2773 (2012)

  17. A. Urich, K. Unterrainer, and T. Mueller
    Silver nanoisland enhanced Raman interaction in graphene
    Appl. Phys. Lett. 101, 153113 (2012)

  18. E. Lausecker - Ultraviolet nanoimprint lithography: Fabrication of ordered nanostructures, integrated optics and electronic devices
    Südwestdeutscher Verlag für Hochschülerschriften, Taschenbuch, ISBN: 978-3-8381-3080-4 (2012)

  19. Dostálek J and Knoll W (2012) Plasmonics. In: Matyjaszewski K and Möller M (eds.) Polymer Science: A Comprehensive Reference, Vol 2, pp. 647â??659. Amsterdam: Elsevier BV. â?? book chapter

  20. Y. Wang, C. J. Huang, J. Dostalek,  "Evanescence wave biosensors with hydrogel binding matrix" in "Handbook of Biofunctional Surfaces" edited by Wolfgang Knoll, Pan Stanford Publishing, Singapore (2012) ISBN: 9789814316637 â?? book chapter

  21. Nano- and microstructuring of graphene using UV-NIL â?? I. Bergmair, W. Hackl, M. Losurdo, C. Helgert, G. Isic, M. Rohn, M.M. Jakovijevic, T. Mueller, M. Gaingregorio, E.-B. Kley, T. Fromherz, R. Gajic, T. Pertsch, G. Bruno, M. Muehlberger - Nanotechnology 23 (2012) 335301 (6pp)

  22. Bloch Surface Wave-Enhanced Fluorescence Spectroscopy Biosensor,
    Biosensors and Bioelectronics (2013), 43, 108-114
    K. Toma, E. Descrovi, M. Toma, M. Ballarini, P. Mandracci, F.Giorgis, A.Mateescu, U. Jonas, W. Knoll and J. Dostalek

  23. Long Range Surface Plasmon Resonance Biosensor for Magnetic Nanoparticle-Enhanced Detection of Bacterial Pathogens,
    Analytical Chemistry, (2012), 84, 8345-8350
    Y. Wang, W. Knoll, J. Dostalek,

  24. Surface plasmon-coupled emisson on plasmonic Bragg gratings
    Optics Express, 20 (13) 14042-14053 (2012)
    M. Toma, K. Toma, P. Adam, J. Homola, W. Knoll, J. Dostalek

  25. Anisotropic remastering for reducing feature sizes on UV nanoimprint lithography replica molds
    Nanotechnology, 16, 165302 (2012)
    E. Lausecker, M. Grydlik, M. Brehm, I. Bergmair, M. Mühlberger, T. Fromherz, G. Bauer

  26. Thin Hydrogel Films for Optical Biosensor Applications
    Membranes 2012, 2, 40-69; doi:10.3390/membranes2010040
    Anca Mateescu, Yi Wang, Jakub Dostalek and Ulrich Jonas

  27. Bragg-Scattered Surface Plasmon Microscopy: Theoretical Study
    Plasmonics, DOI: 10.1007/s11468-011-9306-4
    Mana Toma, Wolfgang Knoll and Jakub Dostalek

  28. Nanostructures in protein chips: Effect of print buffer additive and wettability on immobilization and assay performance
    Claudia Preininger, Ursula Sauer, Mustapha Chouiki, Rainer Schöftner; Microelectronic Engineering Vol 88, Issue 8 (2011)

  29. Nanoimprinted complementary organic electronics: Single transistors and inverters
    Thomas Rothländer,Ursula Palfinger, Barbara Stadlober, Anja Haase, Herbert Gold, Christian Palfinger, Gerhard Domann, Johanna Kraxner, Georg Jakopic, Paul Hartmann J. Mater. Res., Vol. 26, No. 19 (2011)

  30. The significance of redeposition and backscattering in nanostructure formation by focused ion beams
    Sloan Lindsey, Gerhard Hobler
    Nuclear Instruments and Methods in Physics Research B 282 (2012) 12-16

  31. Quantitative simulation of ion-beam induced deposition of nanostructures
    Christoph Ebm, Gerhard Hobler, Simon Waid, Heinz D. Wanzenboeck
    J. Vac. Sci. Technol. B 29(1) Jan/Feb 2011, 011031

  32. Topography simulation of sputtering using an algorithm with second order approximation in space
    Matthias Budil and Gerhard Hobler
    Nuclear Instruments and Methods in Physics Research B 269 (2011) 1614ââ?¬â??1618

  33. Single and multilayer metamaterials fabricated by nanoimprint lithography
    I Bergmair, B Dastmalchi, M Bergmair, A Saeed, W Hilber, G Hesser, C Helgert, E Pshenay-Severin, T Pertsch, E B Kley, U Hübner, N H Shen, R Penciu, M Kafesaki, C M Soukoulis, K Hingerl, M Muehlberger and R Schoeftner
    Nanotechnology 22 (2011) 325301 (6pp)

  34. Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nm hp
    M. Muehlberger, M. Boehm, I. Bergmair, M. Chouiki, R. Schoeftner, G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Narzt, E. Lausecker, T. Fromherz
    Microelectronic Engineering 88 (2011) 2070-2073

  35. UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays 
    E. Lausecker, M. Brehm, M. Grydlik, F. Hackl, I. Bergmair, M. Mühlberger, T. Fromherz, F. Schäffler, and G. Bauer 
    Appl. Phys. Lett. 98, 143101 (2011)

  36. Impact of energy alignment and morphology on the efficiency in inorganic-organic hybrid solar cells
    Organic Electronics 11 (2010)1999
    M. Gruber, B.A. Stickler, G. Trimmel, F. Schürrer, K. Zojer

  37. Excitation Intensity Driven PL Shifts of SiGe Islands on Patternded and Planar Si(001) substrates, Evidence for Ge-rich Dots in Islands
    Nanoscale Res Lett (2010) 5:1868-1872
    M. Brehm, M. Grydlik, F. Hackl, E. Lausecker, T. Fromherz, G. Bauer

  38. Tuning the threshold voltage in organic thin film transistors by local channel doping using photoreactive interfacial layers
    Advanced Materials, 2010, 22, 47,5361-5365,  DOI:10.1002/adma.201002912
    Marco Marchl, Matthias Eder, Barbara Stadlober, Anja Haase, Alexander Fian, Gregor Trimmel, Thomas Griesser, Egbert Zojer 

  39. Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting
    Advanced Materials, 2010, 22, 45, 5115-5119, DOI: 10.1002/adma.201001947
    Ursula Palfinger, Christoph Auner, Herbert gold, Anja Haase, Johanna Kraxner, Thomas Haber, Meltem Sezen, Werner Grogger, Gerhard Domann, Georg Jakopic, Joachim R. Krenn, Barbara Stadlober

  40. Projection Charged Particle Nanolithography and Nanopatterning
    Jpn. J. Appl. Phys. 49 (2010) 06GE01
    Hans Loeschner, Christof Klein, and Elmar Platzgummer

  41. Modelling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2
    J. Vac. Sci. Technol B 28(5), (2010) 946
    Christoph Ebm, Gerhard Hobler, Simon Waid, Heinz D. Wanzenboeck

  42. Self-aligned imprint lithography for top-gate amorphous silicon thin-film transistor fabrication
    Applied Physics Letters 96, 263501 (2010)
    E. Lausecker, Y. Huang, T. Fromherz, J.C. Sturm, S. Wagner 

  43. Photochemical control of the carrier mobility in pentacene-based organic thin-film transistors
    Applied Physics Letters 96, 213303 (2010)
    M. Marchl, A. W. Golubkov, M. Edler,   Th. Griesser, P. Pacher, A. Haase, B. Stadlober, M.R. Belegratis, G. Trimmel, E. Zojer

  44. High-performing submicron organic thin-film transistors fabricated by residue-free embossing
    Organic Electronics 12 (2010) 552-557
    Ch. Auner, U. Palfinger, H. Gold, J. Kraxner, A. Haase, Th. Haber, M. Sezen, W. Grogger, G. Jakopic, J.R. Krenn, G. Leising, B. Stadlober

  45. Charged Particle Nanopatterning
    Journal of Vacuum Science and Technology B 27(6), pp 2707 2710 (Nov/Dec 2009)
    Elmar Platzgummer and Hans Loeschner

  46. 3D Materials Made of Gold Using Nanoimprint Lithography
    Microelectronic Engineering 87  (2010) 1108 - 1010
    I. Bergmair, M. Mühlberger, K. Hingerl, R. Schöftner

  47. Diffusion of Thioles during microcontact printing with rigid stamps
    Microelectronic Engineering 87 (2010) 848 - 850
    I. Bergmair, M. Mühlberger, E. Lausecker, K. Hingerl, R. Schöftner

  48. Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition
    Journal of Vacuum Science and Technology B 27(6) 2668-2673 (2009)
    Christoph Ebm, Elmar Platzgummer, Hans Loeschner, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruedinger Reitinger, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Florian Letzkus, Matthias Irmscher

  49. Nanoimprint Lithography stamp modification utilizing focused ion beams
    Journal of Vacuum Science and Technology B 27(6) 2679-2685 (2009)
    Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner

  50. Residue-free room temperature UV-nanoimprinting of submicron organic thin film transistors 
    Organic Electronics (2009), 1466-1472
    Ch. Auner, U. Palfinger, H. Gold, J. Kraxner, A. Haase, T. Haber, M. Sezen, W. Grogger, G. Jakopic, J. R. Krenn, G. Leising, B. Stadlober

  51. Assessment of approximations for efficient topography simulation of ion beam processes: 10 keV Ar on Si 
    Nuclear Instruments and Methods in Physics Research B 267 (2009) 2987-2990
    Christoph Ebm, Gerhard Hobler

  52. Threshold voltage Shifts due to Space Charge and Dipole Layers at the Dielelectric surface of Organic Thin-Film Transistors
    Advanced Functional Materials, 19(6), 958-967 (2009)
    St. Possanner, K. Zojer, P. Pacher, E. Zojer, F. Schürrer

  53. Optical Design of 2D confined structures with metamaterial layers based on coordinate transformations
    Phys. Scr. T135 (2009) 014045 (5pp)
    B. Vasic, G. Isic, R. Gajic, K. Hingerl

  54. UV-NIL with working stamps made from Ormostamp
    Microelectronic Engineering, 86 (4-6) (2009) 691-693
    M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, R. Schöftner

  55. Reversal �µCP using hard stamps
    Microelectronic Engineering, 86 (4-6) (2009) 650-653
    I. Bergmair, M. Mühlberger, W. Schwinger, K. Hingerl, E.-B. Kley, H. Schmidt, R. Schöftner

  56. Coordinate transformation based design of confined metamaterial structures
    Phys. Rev. B 79, 085103 (2009) 
    Boris Vasic, Goran Isic, Rado�¡ Gajic, Kurt Hingerl
    see also
  57. Results obtained with the CHARPAN Enigneering Tool and prospects of the ion Mask Exposure Tool (iMET)
    Photomask, Bacus News 25 (2) February 2009
    Elmar Platzgummer, Hans Loeschner and Gerhard Gross

  58. Projection maskless patterning for nanotechnology applications
    J. Vac. Sci. Technol. B 26(6), pp. 2059-2063 (Nov/Dec 2008) 
    E. Platzgummer, H. Loeschner, G. Gross