Short Project Description


The phasing out of the project NILstamp_replication is determined to push issues addressed in NILaustria_I to a level allowing further exploitation. This phasing out project pushes forward the fabrication of working stamps from large 4รข?? masters with (i) complex 2.5D or multilevel features as well as (ii) with sub-30nm features provided by the CHARPAN tool. Driven by the high industrial impact also nanoimprint lithography with ultrathin residual layers and subsequent pattern transfer will be dealt with. These industrial-scale working stamps as well as the pattern transfer processes to be developed are key enablers for the industrialization of Nanoimprint lithography as a competitive high volume production solution for various market segments.


Schematic presentation of UV-NIL and n-CP processes for the fabrication of patterned media