Publications

  1. Modelling of precursor coverage in ion-beam induced etching and verification with experiments using XeF2 on SiO2
    J. Vac. Sci. Technol B 28(5), (2010) 946
    Christoph Ebm, Gerhard Hobler, Simon Waid, Heinz D. Wanzenboeck
  2. Maskless Lithography and nanopatterning with electron and ion multibeam projection
    Elmar Platzgummer
    Proc SPIE Vol. 7637 (2010) 763703-1-12
  3. eMET - 50keV Mask Exposure Tool Development based on proven multi-beam projection technology
    Elmar Platzgummer, Stefan Cernusca, Christof Klein, Jan Klikovits, Samuel Kvasnica, Hans Loeschner
    Proc SPIE Vol. 7823 (2010) 782308-1-12
  4. Projection mask-less lithography and nanopatterning with electron and ion multi-beams
    Christof Klein, Elmar Platzgummer, Hans Loeschner
    EMLC 2010, Proc of SPIE Vol 7545 (2010) 75450Q-1
  5. 50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5nm sized beams
    Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, Hans Loeschner
    SPIE Advanced Lithography 2010, Proc. SPIE 7637 (2010) 76370B-1
  6. eMET: development of a 50 keV electron projection mulitbeam mask exposure tool for the 16nm hp technology node and below
    Elmar Platzgummer, Stefan Cernusca, Christof Klein, Samuel Kvasnica, Bernd Sonalkar, Hans Loeschner
    Photomask Japan 2010, Proc. SPIE Vol. 7748 (2010) 77480H-1
  7. Charged Particle Nanopatterning, Journal of Vacuum Science and Technology B 27(6), pp 2707 2710 (Nov/Dec 2009) Elmar Platzgummer and Hans Loeschner

  8. Ion multibeam nanopatterning for photonic applications: Experimants and simulations, including study of precursor gas induced etching and deposition
    Journal of Vacuum Science and Technology B 27(6) 2668-2673 (2009)
    Christoph Ebm, Elmar Platzgummer, Hans Loeschner, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruedinger Reitinger, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Florian Letzkus, Matthias Irmscher

  9. Nanoimprint Lithography stamp modification utilizing focused ion beams
    Journal of Vacuum Science and Technology B 27(6) 2679-2685 (2009)
    Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner
  10. Assessment fo approximations for effiecient topography simulation of ion beam processes: 10 keV Ar on Si
    Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 267 (2009) 2987-2990
    Christoph Ebm, Gehard Hobler

  11. UV-NIL with working stamps made from Ormostamp
    Microelectronic Engineering 86 (4-6) 691- 693 (2009)
    M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, R. Schöftner
  12. Results obtained with the CHARPAN Enigneering Tool and prospects of the ion Mask Exposure Tool (iMET)
    Photomask, Bacus News 25 (2) February 2009
    Elmar Platzgummer, Hans Loeschner and Gerhard Gross
  13. Projection maskless patterning for nanotechnology applications
    J. Vac. Sci. Technol. B 26(6), pp. 2059 â?? 2063 (Nov/Dec 2008)
    E. Platzgummer, H. Loeschner, G. Gross
  14. Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
    Proc. SPIE Vol. 6921-1O [6921-93]
    C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel, M. Tmej, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz
  15. PML2: the maskless multibeam solution for the 22-nm node and beyond
    Proc. SPIE / Volume 7271 / Multibeam and Tools Patterning 
    C. Klein, E. Platzgummer, J. Klikovits, W. Piller,  H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle,  J. Kretz, J. T. Nogatch, A. Zepka
  16. Simulation of ion-beam induced etching and deposition using a non-local recoil-based algorithm
    Ch. Ebm, G. Hobler
    Mat Res Soc Proc. 1181 (2009) DD03-04 

Conference Contributions

 

EMLC 2010

  • Masters for Substrate Conformal Imprint Lithography (SCIL) generated by Charged Particle Nanopattering (CHARPAN) Techniques - invited talk

NNT 2009

  • Sub 50nm working stamps for nanoimprint lithography from CHARPAN Tool exposed master templates - M. Mühlberger, I. Bergmair, M. Chouiki, E. Platzgummer, H. Loeschner, P. Joechl, R. Reitinger, M. Kuemmel, Ch. Ebm, M. Kast, G. Kreindl, R. Schöftner - poster presentation

EIPBN 2009

  • Ion Multi-Beam Nanopatterning for Photonic Applications: experiments and simulations, including study of precursor gas induced etching and deposition - Christoph Ebm, Elmar Platzgummer, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruediger Reitinger, Florian Letzkus, Mathias Irmscher, Gerhard Gross, Hans Loeschner - oral presentation
  • Charged Nanoparticle Patterning (CHARPAN) - E. Platzgummer, H. Löschner - abstract pdf (349kB) - invited talk
  • Programmable Aperture Plate System with integrated CMOS electronics for projection maskless nanolithography and patterning - Ch. Klein, E. Platzgummer, H. Löschner, F. Letzkus, M. Jurisch, M. Irmscher, M. Witt, W. Pilz - abstract pdf (272kB) - invited talk

PMJ 2009
SPIE Photomask and NGL Mask Technology XII

  • Go Proton: Investigation on Mask Patterning of the 22nm hp Node using a ML2 Multi Beam System
    Jörg Butschke et al. (IMS Chips (Germany)) - poster

MRS Spring Meeting 2009

  • Simulation of ion-beam induced etching and deposition using a non-local recoil-based algorithm
    Ch. Ebm, G. Hobler - oral presentation

 

SPIE Advanced Lithography 2009 - Alternative Lithographic Technologies

COSIRES 2008

  • Assessment of approximations for efficient topography simulation of ion beam processes: 10keV Ar on Si - Ch. Ebm, G. Hobler - oral presentation

NNT 2008

  • UV-NIL using Working Stamps made from Ormostamp - M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Löschner, Ch. Ebm, W. Schwinger, G. Grützner, R. Schöftner -  poster

MNE 2008

  • UV-NIL with Working Stamps made from Ormostamp - Michael Mühlberger, Iris Bergmair, Anna Klukowska, Anett Kolander, Hans Martin Leichtfried, Wolfgang Schwinger, Gabi Grützner, Rainer Schöftner - poster

Nanolith08

  • Projection Mask-Less Patterning (PMLP): key to flexible and cost-effective nano-system fabrication
    H. Loeschner - plenary talk

BACUS 2008
SPIE Photomask Technology 2008

FEBIP 2008

  • Projection Mask-Less Patterning (PMLP) for Nanotechnology Applications
    H. Loeschner - keynote lecture

EIPBN 2008

SPIE Advanced Lithography 2008

  • Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
    C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel, M. Tmej, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz - invited talk
  • Magic: A European program to push the insertion of maskless lithography
    L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, and J. Weber - contributed talk

 

 

 

Events

  • Information event for the NMP call FP7 summer 2009: Ein erfolgreich durchgeführtes RP6 Projekt: CHARPAN - Hans Löschner, IMS Nanofabrication AG - pdf (1249kB) >>more information

Press Releases

Ein Stempel für Computerchips TU Vienna 2008-08-18

 

Press Coverage

Der Standard - Wiener Forscher entwickeln Methode zur weiteren Verkleinerung von Chips - 18. August 2008

Der Standard - Wiener Forscher entwickeln neue Methode zur Chip-Herstellung - 18. August 2008

Nanofacts - Ein Stempel für Chips - September 2008 p 28 (or as e-paper here)

infozin "Ein Stempel für Computerchips" - 01.09.2008

StartBlatt "Ein Stempel für Computerchips"