The ambitious goal of this project is to develop a mask and resistless manufacturing technology for NIL stamps. This is based on direct deposition and etching of material with charged particles. A massively parallel charged particle patterning technology (PMLP - Projection Mask-Less Patterning (by IMS Nanofabrication will support ultraprecise etching and precipitation of either a rigid nanostructured mask or the nanostructures for the stamp itself. The ability to create metallic and dielectric nanostructures (of <20 nm) and even complex 3-D structures directly on arbitrary surfaces will be a pioneering breakthrough in the manufacturing of NIL stamps.