Negative refractive index materials (NIMs) are artificially structured materials, where the designed structures provide resonances for the electric and magnetic field (e.g. light) such that negative refraction occurs. The structure size of NIM is small in comparison to the wavelength. Within the NILmeta project we want to fabricate negative index materials (NIMs) by Nanoimprint Lithography (NIL).
Two different types of NIL will be used to achieve structures made of gold or silver:

  • UV-NIL and Lift-off Process
  • Nano Contact Printing (n-CP)  

We will investigate the spectroscopic ellipsometric response of these NIMs at different wavelengths from the infrared to the ultraviolet regime. These measurements will be compared to finite difference time domain and finite element eigenvalue simulations.