Publications

  • UV-NIL with working stamps made from Ormostamp
    Microelectronic Engineering, In Press, Corrected Proof
    M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Loeschner, Ch. Ebm, G. Grützner, R. Schöftner

 

 

Conference Contributions

NNT 2008

  • UV-NIL using Working Stamps made from Ormostamp - M. Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Löschner, Ch. Ebm, W. Schwinger, G. Grützner, R. Schöftner -  poster
  • Soft UV-NIL Enables Industrial Applications - T. Glinsner, G. Kreindl, A. Malzer, R. födisch, P. Lindner, M. Wimplinger, R. Miller - poster

MNE 2008

  • UV-NIL with Working Stamps made from Ormostamp - Michael Mühlberger, Iris Bergmair, Anna Klukowska, Anett Kolander, Hans Martin Leichtfried, Wolfgang Schwinger, Gabi Grützner, Rainer Schöftner - poster
  • Novel transparen hybrid polymer working stamps for UV-imprint - Anna Klukowska, Anett Kolander, Iris Bergmair, Michael Mühlberger, Hans Martin Leichtfried, Freimut Reuther, Gabi Grützner, Rainer Schöftner - poster
  • The Use of working stamps in nanoimprint lithography as an enabling technology for industrial applications - T. Glinsner, G. Kreindl, A. Malzer, R. Födisch, P. Lindner, M. Wimplinger, R. Miller - poster