NILquantumdot

In this project, a process based on ultraviolet nano-imprint lithography will be developed that allows the definition of large area (approximately 1 cm²), defect free Silicon templates with structure sizes around 50 nm and periods of 100 nm. These templates will be used to optimize the growth of Germanium quantum dots with high uniformity on predefined positions as well as the position controlled deposition of solution processed nano-crystals. Potential applications of these ordered nanostructures on large areas in the fields of optoelectronic, spintronic and nano-electronic will be demonstrated.