NILplasmonics aims to integrate Nanoimprint Lithography (NIL) in a high throughput production process of plasmonic biochips to fully exploit the metal enhanced fluorescence effect for more sensitive detection of protein markers and cell receptors. In order to prepare plasmonic nanostructures on up to 12 array fields (7x7 mm each) of biochips R2R NIL and step-and-repeat NIL that enable the replication of nanometer features on larger areas at low cost and high throughput will be implemented.