NILquantumdot II

NILquantumdot II

We will utilize the unique capabilities of UV-NIL to structure large substrate areas with features in the nm region in one process step for pushing forward the current understanding of SiGe quantum dot growth and their application in a Si based integrated optics. This future technology will also be implemented based on site-controlled deposition of nano-crystals, where self-alignment techniques will be used to develop a highly efficient process flow.