In May 2017, the 7th edition of the NIL Industrial Day symposium will be held in Berlin, Germany (May 2-3, 2017). The NIL Industrial Day is the major event supplementing the academic and scientific oriented conferences with the aim to inform industrial early adopters and those companies evaluating to invest in Nanoimprint Lithography (NIL) as manufacturing method on the status of NIL for production purpose.
Tentative program – NILindustrialday 2017
The tentative program will cover the following topics …
- Nanopatterning Applications in Lilfe-Sciences & Photonics
- Industrial Nanopatterning: Solutions
- Inudstrial Nanopatterning: Production
- Future Visions & Associated Technologies
Confirmed speakers at NIL Industrial Day 2017 are …
- Hiroshi Goto, Toshiba Machine (Japan)
- Anja Boisen, DTU NANOTECH (Denmark)
- Karen Chong, IMRE (Singapore)
- Martin Eibelhuber, EV Group (Austria)
- Eleonora Storace, Süss MicroTec (Germany)
- Marc Verschuuren, Philips SCIL Nanoimprint Solutions (Netherlands)
- Theodor Nielsen, NIL Technology (Denmark)
- Nikos Kehagias, Nanotypos (Greece)
- Hayden Taylor, Simprint (USA)
- Herbert Kleinjans, AMO GmbH (Germany)
- t.b.d., PiXDRO (Netherlands)
Take advantage and be involved in …
- Technology discussions initiated by 20 oral contributions
- Several hours of networking opportunities with approx. 100-130 highly skilled participants
- Newest developments displayed at the technical exhibition
Further information on detailed program, venue and registration will be available soon on the frequently updated conference website:
Your contact
Dr. Michael Mühlberger
Functional Surfaces and Nanostructures
+43 7252 885 253
michael.muehlberger@nullprofactor.at
